MR5 is a system developed for repairing large size clear defects beyond 10µm on photomasks
with focused ion beam. Combination of cutting-edge platform and Hitachi High-Tech Science's accumulated reparing technology makes highly precise defect repair possible.
MR7 repairs defects in semiconductor device photomasks and reticles with focused ion beam in response to next generation thin film devices of 65 nm node and beyond. This system repairs extremely small defects with complex shapes in binary, halftone, and other photomasks with high accuracy and minimal damage.